We are independent & ad-supported. We may earn a commission for purchases made through our links.
Advertiser Disclosure
Our website is an independent, advertising-supported platform. We provide our content free of charge to our readers, and to keep it that way, we rely on revenue generated through advertisements and affiliate partnerships. This means that when you click on certain links on our site and make a purchase, we may earn a commission. Learn more.
How We Make Money
We sustain our operations through affiliate commissions and advertising. If you click on an affiliate link and make a purchase, we may receive a commission from the merchant at no additional cost to you. We also display advertisements on our website, which help generate revenue to support our work and keep our content free for readers. Our editorial team operates independently of our advertising and affiliate partnerships to ensure that our content remains unbiased and focused on providing you with the best information and recommendations based on thorough research and honest evaluations. To remain transparent, we’ve provided a list of our current affiliate partners here.
Manufacturing

Our Promise to you

Founded in 2002, our company has been a trusted resource for readers seeking informative and engaging content. Our dedication to quality remains unwavering—and will never change. We follow a strict editorial policy, ensuring that our content is authored by highly qualified professionals and edited by subject matter experts. This guarantees that everything we publish is objective, accurate, and trustworthy.

Over the years, we've refined our approach to cover a wide range of topics, providing readers with reliable and practical advice to enhance their knowledge and skills. That's why millions of readers turn to us each year. Join us in celebrating the joy of learning, guided by standards you can trust.

What is Reactive Ion Etching?

By Donn Saylor
Updated: May 17, 2024
Views: 7,095
Share

Reactive ion etching is a type of technology used in microfabrication to remove substances from wafers. Wafers are small semiconductor strips used in the creation of microdevices, and reactive ion etching technology ensures they remain free of materials that could negatively impact their efficacy. Microfabrication procedures are performed with specially designed devices that pinpoint the substance to be removed without sacrificing the integrity of the wafer.

The most common reactive ion etching device is made of a cylinder-shaped vacuum compartment with an isolated holder for the wafer attached to the bottom part of the chamber. There are small holes in the top of the vessel that let in gas. Various types of gases are used, depending on the individual requirements of a particular wafer.

Inductively coupled plasma is another mode of this technology. With this device, the plasma is crafted by a highly specialized magnetic field. It is not uncommon to attain high levels of plasma concentration with this method.

Reactive ion etching plasma is a state of matter that is chemically reactive and is created by the more standard radio frequency (RF) electromagnetic field. Ions within the plasma have an unusually high amount of energy. These ions react to the debris on a wafer and work to remove the defects on its surface.

The chemical process involved in reactive ion etching is a multi-faceted one. First, a substantial electromagnetic field is sent to the wafer chamber. The field then oscillates, which ionizes the molecules of gas in the vessel and removes their electrons. This results in the creation of the plasma.

Reactive ion etching is one type of a broader category of microfabrication removal called dry etching. It uses no liquids in the removal process, unlike wet etching, which uses various acids and chemicals to achieve the same end. Since wet etching causes undercutting to the wafer, as well as significant amounts of toxic waste, dry etching is becoming a more popular method of wafer chemical removal.

One of the major drawbacks of reactive ion etching is cost. Compared to wet etching techniques, it is much more expensive due to the specialized equipment needed. Dry etching processes in general are far more effective in reaching trickier areas of a wafer, however. It is important to remember, though, that some jobs do not require the minute detail provided by this form of etching, and wet etching procedures may accomplish the task just as effectively.

Share
About Mechanics is dedicated to providing accurate and trustworthy information. We carefully select reputable sources and employ a rigorous fact-checking process to maintain the highest standards. To learn more about our commitment to accuracy, read our editorial process.
Discussion Comments
Share
https://www.aboutmechanics.com/what-is-reactive-ion-etching.htm
Copy this link
About Mechanics, in your inbox

Our latest articles, guides, and more, delivered daily.

About Mechanics, in your inbox

Our latest articles, guides, and more, delivered daily.